Introduction of Technical Presentations

We will introduce the contents of technical presentations on Vacuum Coating and Surface Modification products.

Archive

2024
Release of diamond polishing technology
By combining with ShinMaywa 's diamond coating, we have achieved short polishing times (ShinMaywa Patent No. 7212579) Diamond coating polishing technology
2024
Development of a new linear ion source
News: An article was published in the Nikkan Kogyo Shimbun
News: Sales of large ion beam source "Linear Ion Source" commenced
Linear Ion Source
2023
Winner of the 15th Iwaki Tribo Coating Network Award (Iwaki Prize)
Received a business award for "Development of a cutting edge sharpening device for diamond coating tools"
Mechanical Surface Tech (External link)
Plasma ion processing equipment
2018
Development of diamond coating equipment
News: Diamond coating equipment developed
Diamond Coating Equipment
2017
Launch of the VRD750AD single-axis deposition polymerization system
Batch type vapor deposition + plasma polymerization system
2014
Started selling ion etching equipment
Ion Etching System
2014
Started sales of plasma ion processing equipment
Plasma Ion Processing System
2012
Launch of the VRD650AD two-axis deposition polymerization system for high-mix low-volume production
Batch type vapor deposition + plasma polymerization system
2007
Development of large-capacity ultra-low temperature cooling equipment
ShinMaywa Technical Report No.29 [PDF:383KB]
2006
Development of an automatic door-opening and closing type deposition polymerization apparatus
ShinMaywa Technical Report No.28 [PDF:79.6KB]
1997
Development of plasma polymerization process deposition equipment
ShinMaywa Technical Report No.19 [PDF:4.12MB]
1991
Development of ultra-low temperature cooling system
ShinMaywa Technical Report No.6 [PDF:1.62MB]
1989
Development of a large-scale continuous vacuum deposition system for optical multilayer films
ShinMaywa Technical Report No.3 [PDF:4.47MB]
Development of -150℃ ultra-low temperature cooling system
ShinMaywa Technical Report No.2 [PDF:2.48MB]

特許

特許名称 登録番号(日本)
真空成膜装置 
【要約】高い反射率が得られ、且つ均一性の高い薄膜を成膜可能な真空成膜装置の提供
4921320 [PDF:157.7KB]
真空成膜装置 
【要約】回転駆動手段の構成を簡略化することにより、簡易で安価に製作できる真空成膜装置の提供
5117943 [PDF:72.1KB]
刃部材及び刃部材の刃縁の加工装置 5210627 [PDF:68.2KB]
真空成膜装置 
【要約】比較的安価な構成により、スイングアームのロックし忘れを防止する真空成膜装置の提供
5216659 [PDF:161.6KB]
刃物、その製造方法およびそれを製造するためのプラズマ装置 5924094 [PDF:589KB]
イオン照射による被覆材の脱膜方法および脱膜装置 6198991 [PDF:5.1MB]
真空成膜装置 
【要約】簡易な構成でかつ、製造コストを抑制することができる真空成膜装置の提供
6600505 [PDF:93.5KB]
ダイヤモンド被膜付き部材およびその製造方法ならびにダイヤモンド被膜の平滑化方法 7212579 [PDF:711.4KB]
成膜装置用の基体回転装置 7710914 [PDF:101.4KB]