Batch type vapor deposition + plasma polymerization system

Features

This vacuum deposition system (PVD deposition system) employs a vertical, two-door design, resulting in improved productivity and operational efficiency.
By utilizing direct vapor deposition technology onto a resin substrate and a flat, opposing discharge electrode, high-adhesion films are achieved even at low temperatures, enabling the formation of reflective and surface protective films.
By applying film thickness control technology cultivated with electron beam deposition equipment, stable thin film formation and reduced aluminum splash are achieved.
As thin film vacuum coating system and thin film formation system, it is expected to be used in a variety of film deposition processes, including optical film formation, electrode formation, barrier film formation, and metallization.
In the future, it is expected to have applications in research and development such as optical components for LiDAR, organic EL film deposition, all-solid-state battery-related materials, and materials development for space and space chambers.

Model	VCD1000AD	VCD1300AD	VCD1450AD	VCD1800AD
Substrate size (Including jigs, etc.)	φ350×1,200mm 4 axes φ320×1,200mm 5 axes	φ400×1,200mm 6 axes φ450×1,200mm 5 axes	φ450×1,500mm 6 axes φ500×1,500mm 5 axes φ550×1,500mm 4 axes	φ450×1,500mm 8 axes φ550×1,500mm 6 axes

Model	VRD650AD	VRD750AD
Substrate size (Including jigs, etc.)	φ540×1,500mm 2 axes	φ600×1,500mm 1 axis

Formation of reflective films, barrier films, and surface protective films on automotive lamp reflectors and various interior and exterior parts.
Formation of reflective films by high-adhesion film deposition on cosmetic containers, mirror components, etc.
Future applications are expected to include high-performance device fields such as optical thin-film deposition, electrode film deposition, multilayer film formation, organic EL deposition, and solar cell deposition.