Diamond Coating System

System sales / Contract development

Technical Information

What is Diamond Coating System?

Diamond is the hardest material currently known, possessing exceptionally superior mechanical, electrical, chemical, and thermal conductivity properties. If coatings utilizing these superior properties can be developed, they could have applications in a wide range of fields, and research and development are currently underway.
Methods for synthesizing diamonds include high-temperature, high-pressure methods, thermal filament CVD, and microwave plasma CVD. These methods are expected to have various applications in the future, including cutting tools, molds, artificial jewelry, electrolytic electrodes, semiconductor devices, heat dissipation substrates, and quantum sensors.

ShinMaywa’s Diamond Coating System

Our diamond deposition system (diamond CVD system) employs the thermal filament CVD method and is capable of large-area diamond deposition on φ300 wafers.
It can be used for mass production in applications such as carbide cutting tool coatings and wear-resistant coatings.
Our proprietary technology optimizes adhesion, enabling the formation of high-hardness coatings on materials such as cemented carbide, SiC, ceramics, and heat-resistant metals.
By controlling the particle size according to the application, it is possible to improve wear resistance and optimize low-friction properties.
It is suitable for forming conductive diamond films and is expected to have applications in diamond electrode deposition and boron-doped diamond deposition.
We also sell and undertake contract development of diamond thin-film deposition equipment.
Leveraging our ion etching technology, we can also offer recycling solutions, including film removal and re-deposition.
We can also propose polishing techniques after diamond film deposition.

Microcystalline diamond coating — Coarse-grained diamond coating

It can also accommodate circuit boards with a diameter of 300mm.

Application

cutting tools

Improved wear resistance

<Application>
Carbide tools (drills, end mills, inserts, etc.)
CFRP processing, graphite processing, aluminum alloy processing

Device

Performance improvements for next-generation devices

<Application>
Power semiconductors, communication boards, heat dissipation boards

gold mold

Longer lifespan than DLC

<Application>
Drill bit, crimping punch

Seal component

Improved durability of sliding surfaces (SiC, cemented carbide)

<Application>
Mechanical seal

Electrode

_CO2 reduction, ozone water generation

<Application>
Diamond electrodes for electrolysis

If you are considering developing new applications, please contact us using the inquiry form below.

Expected future applications

High-performance electrochemical electrodes and sensors using boron-doped diamond film deposition.
Applications include wafer tables, electrostatic chucks, and focus ring components for next-generation semiconductors such as GaN, Ga₂O₃, and SiC.
Applications in plasma-resistant materials and high-performance protective films in the field of nuclear fusion.
Application of heat dissipation material film deposition to thermal management technology for high-power electronic equipment.
Applications of diamond thin-film formation technology in quantum sensors and advanced devices.

System specifications

	Diamond coating machine SDC300	Compact diamond coating device SDC100
System/Method	Hot Filament CVD
Device dimensions (mm)	L2,480×W1,320×H2,240	L950×W2,300×H1,830
Chamber Dimensions (mm)	L620×W600×H500	Lφ440×H470
Can be installed Size (mm)	Tool: φ0.5 - φ20 L200 Flat plate: φ300 t30	Rod shape: φ0.5 - φ20 L100 Flat plate: L100 x W150 x H30
Substrate material	Carbide (WC-Co), silicon (Si), ceramics (SiC), heat-resistant metals (Nb), etc.
Coating length (mm)	50	10
Power supply	3 phase 200V 50kVA A type ground connection	3 phase 200V 20kVA class A grounding
Coolant	25L/min
Gas	CH4, H2, N2 and other ports can be added
Weight	2,000kg	1,200kg

The small dedicated machine SDC100 can also be modified to fit special shapes such as molds.

* The temperature during diamond film deposition is 800-900°C. Therefore, the substrates to which the film can be deposited are limited to those with heat resistance.
When depositing films onto cemented carbide materials, a cobalt-removing pretreatment is necessary.
Crystal sizes can be adjusted to suit the application, ranging from very fine to very coarse grains.
We will propose the most suitable equipment based on your requirements, the object you are working with, and your productivity needs.

In addition to thermal filament CVD diamond systems, we can also propose microwave plasma CVD diamond systems.

↓Click here for details↓

Microwave plasma CVD apparatus

DIAVAC Limited (Our Group Company)