Linear Ion Source

What is a Linear Ion Source (LIS)?

The round ion source installed in the ion etching equipment has been improved and made longer so that it can irradiate a large area.
This enables pre-treatment for wide film production and etching of large workpieces.

Advantage

The conventional LIS structure involves placing a strong permanent magnet in the center to generate a magnetic field.
When removing and attaching parts for maintenance, strong permanent magnets make it difficult to do so, which has been a cause for concern, but by using a unique electromagnetic coil system, no magnetic field is generated when the unit is turned off, making it easier to remove and attach parts and suppressing contamination caused by magnetic attraction. This allows for long-term operation and improves maintainability.

Proposal

We also sell LIS and dedicated high voltage power supply components, and can propose large equipment equipped with LIS.
We are also expanding our size lineup.

Specifications

Model		LIS400	LIS500	LIS600	LIS700	LIS1000
Beam length Lb (mm)		400	500	600	700	1,000
Beam width Wb (mm)		37	37	37	37	37
Output	Maximum applied voltage	Up to 4kV
Output	Maximum current	300 to 400mA (depending on gas type and conditions)
Size (mm)	L:	500	640	730	830	1,350
	W:	160	160	160	200	200
	H:	143	143	164	164	200
Mass (kg)		22kg	25kg	30kg	35kg	55kg
Utility	Cooling water (25℃±2℃　0.35-0.40MPaG)	3L/min				5L/min
Utility	Applicable gas (amount used depends on vacuum furnace volume)	Ar/O₂

Dedicated power supply	High voltage power supply for ion source	Input: Single-phase AC200V-240V 50/60Hz Output: Max DC4kV Max 500mA
Dedicated power supply	Electromagnetic coil power supply	Input: Single-phase AC100V 50/60Hz Output: Max 80V Max 14A (360W)

*Please contact us for beam lengths of 1,000 mm or more.
*The specifications or functions described may be changed without notice due to technical improvements, etc.