Linear Ion Source
What is a Linear Ion Source (LIS)?
A linear ion source (LIS) is a linear ion source (broadbeam ion source) that is an improvement over conventional circular ion sources.
This ion beam source has been made longer to enable uniform irradiation over a large area.
We provide pre-treatment for film deposition and substrate preparation in wide film manufacturing, as well as ion beam pre-treatment, surface cleaning, and surface activation treatment for large workpieces.
By using it as a pre-processing step for ion-assisted film deposition, it contributes to improved adhesion and film deposition quality.
Because it enables large-area ion treatment, it is suitable for uniform pretreatment and surface modification applications on films and large substrates.
Advantages
Conventional ion sources employed a permanent magnet system.
When removing and reattaching parts for maintenance, the strong permanent magnets made it difficult, raising concerns about maintenance.
By employing a unique electromagnetic coil system, we have improved maintainability and suppressed contamination caused by magnetic adsorption, thereby achieving a stable ion processing environment.
It is designed to handle long operating times and is also expected to be applicable to high-throughput in-line processes.
- Thanks to its uniform irradiation performance, stable etching and cleaning processes are possible even when processing large areas.
- It is also expected to be applicable to pretreatment applications for films and functional materials where low-damage processing is required.
Proposal
- In addition to selling the linear ion source unit and dedicated high-voltage power supply components, we also offer proposals for their integration into ion-assisted film deposition systems and large-area processing equipment.
- With selectable beam lengths to suit various applications, we propose its use in a wide range of film manufacturing lines and large-scale substrate processes.
Usage/application examples
- Pre-film formation cleaning, surface cleaning, and surface activation treatment in the film manufacturing process.
- Pre-processing for ion-assisted film deposition in vacuum deposition and sputtering systems.
- A treatment to improve adhesion performed before forming thin films such as electrode films, optical films, and protective films.
- Large-area ion treatment and surface modification of resin films and large substrates.
- Future applications include pretreatment in inline film deposition processes for display materials, electronic components, and energy devices.
Specifications
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*The specifications or functions described may be changed without notice due to technical improvements, etc.
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