Ion etching is a type of dry etching technique that physically processes an object by irradiating it with ionized atoms.
This device functions as an ion beam etching system, enabling high-precision processing and precise etching.
Our company utilizes its unique ion beam etching technology to develop ion etching equipment for cutting tools, molds, and various parts.
The film removal process allows for the reuse of the substrate, contributing to cost reduction and efficient resource utilization.

There is a de-coating method using chemical but it may cause damages to a substrate and uses different chemical liquids depending on coating types.
When using hard metal alloy as a substrate, its component, cobalt is melted by chemical and the surface gets damaged, therefore it is considered to be difficult to reuse.

Our dry etching equipment is an effective, environmentally friendly film removal technology that does not use chemicals.
By using a dry process that does not involve the use of chemicals, we achieve low-damage processing that minimizes damage to the substrate surface.
In addition to film removal, we can also handle high-precision processing such as microburr removal, tip shape correction, microfabrication, and nanofabrication.

Our lineup ranges from compact models for high-mix, low-volume production to high-performance models, catering to various dry etching equipment applications.
We will propose the most suitable ion etching equipment and microfabrication equipment according to the target material and processing requirements.

AlCrN series

Substrate：Carbide
Coating type：AlCrN(2-3μm)

Applications include etching optical components and precision machining of lens molds.
It is also expected to be used in surface preparation processes before the formation of fine patterns.

We utilize microfabrication technology to remove minute burrs from precision parts such as hypodermic needles.
This is expected to stabilize quality through uniform etching.