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Chamber arrangement and system layout are all up to the customer's preference.
Large chamber having maximum 3,000mm square in size by combining transportation robot in vacuum,
gate valve, peripheral equipments, etc. can configure the tailor made system.
The system is used at optics, semiconductor, LCD and other high-tech film deposition.
6 Chambers Cross Line Twin Coater (Exhibition model)
Large Scale complex vacuum system " Multi-chambers System " is introduced.
Large substrate domes (eachφ1,600mm) is processed at two evaporation chambers separately in parallel. This is full automatic system.
Vertical inline high speed sputtering system combined with carriers conveyer.
Specially designed transportation tool provides wide space in vacuum chamber. SPD (Ion plating) can also be installed in it.